HIGH FREQUENCY POWER SUPPLY DEVICE FOR GENERATION OF DISCHARGE PLASMA AND SEMICONDUCTOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To generate a discharge plasma quickly while the impedance matching conditions are well met instantly in association with impression of a high frequency power, and after generation, maintain the discharge plasma stably. SOLUTION: A plasma generation sensor 13 is furnished to sense plasma generated by a discharge plasma generator 6, and a frequency control circuit 14 is installed which varies the oscillating frequency of an oscillator circuit 12 by frequency in the varying range matching with the resonance frequency of the load impedance before discharging until the sensor 13 is actuated as sensing plasma generation and makes changeover control to a fixed frequency set previously so that the oscillating frequency of the oscillator circuit 12 matches with the optimum resonance frequency of the load impedance after the actuation of the sensor 13.