| 摘要 |
PROBLEM TO BE SOLVED: To accurately form a resolution chart and also to restrain the defect of circuit operation by performing patterning by reversing a first pattern unrelated to the circuit operation with a second pattern related to the circuit operation. SOLUTION: As to the circuit pattern 1 of the photomask 3A; a light shielding film 10A remains on the pattern part, and the film 10A is removed at the back ground part and a transparent board 10B is exposed. As to the resolution chart pattern 2A on the photomask 3A; the pattern inside a reversing area P is reversed with the pattern arranged at the area other than the reversing area P so as to perform patterning. That is, at least the part or all of a specified pattern unrelated to the circuit operation is reversed with the circuit pattern 1 related to the circuit operation so as to perform patterning. Consequently, the specified pattern can be accurately formed and also the defect of the circuit operation can be restrained. |
