| 摘要 |
PROBLEM TO BE SOLVED: To obtain a chemically amplified positive resist material having high sensitivity and high resolution by incorporating an org. solvent, a specified high molecular compd., an acid generating agent and a dissolution controlling agent. SOLUTION: This resist material contains an org. solvent, a high molecular weight compd. having repeating units represented by the formula and a wt. average mol.wt. of 3,000-300,000, an acid generating agent and a dissolution controlling agent which is a compd. having a wt. average mol.wt. of 100-1,000 and acid-unstable groups substd. for the hydrogen atoms of phenolic hydroxyl groups at 10-100% rate on average. In the formula, R<1> is H or methyl, each of R<4> and R<5> is H or 1-6C straight chain or branched alkyl, R<6> is 1-10C straight chain, branched or cyclic alkyl, (p), (q) and (r) are positive numbers satisfying 0.02<=p/(p+q+r)<=0.5, 0.01<=q/(p+q+r)<=0.3 and 0<(p+q)/(p+q+r)<=0.8 and (a) is a positive number of 1-3. |
