VERFAHREN ZUR HERSTELLUNG SAUBERER,ORIENTIERTER CdTe OBERFLÄCHEN

摘要

Chemically-etched and or sputtered CdTe surfaces are exposed to UV excimer laser radiation at a fluence ranging from about 15 to 75 mJ/cm2, followed by either a low temperature (<300 DEG C.) thermal anneal or exposure of the CdTe surface to UV excimer laser radiation at a fluence lower than the threshold fluence. This procedure provides clean, stoichiometric, and well-ordered CdTe surfaces.