DETACHING APPARATUS OF MASK

摘要

A device is described that can correctly attach a paricle to a mask with a equal pressure. A body 14 is provided with an absorption pad 5 and piston 3 which absorb and thereby pull a mask 1, a vacuum removal valve 16 for removing a vacuum pressure by an air inflow and a compressing spring 6 for recovering the location of the absorption piston 3, so that the absorption piston 3 can fall down at a vacuum absorption. The absorption pad 5 is protruded, and the mask 1 and paricle 2 are thus seperatedly mounted at the body 14. The body 14 is provided with a vacuum tube 10 and elbow 11 for transmitting the vacuum pressure of a vacuum pump 15, and a selection valve 8 for supplying or blocking the vacuum pressure. Thereby, it is possible to improve the quality of a semiconductor product.