发明名称 MULTIPLE OXIDE FILM
摘要 PROBLEM TO BE SOLVED: To efficiently and easily obtain a thick multiple oxide film excellent in electrical characteristics by hydrothermally treating a deposited layer of multiple oxide powder formed on a substrate with a specified aq. alkali soln. SOLUTION: A deposited layer of multiple oxide powder is formed on a substrate and hydrothermally treated with an aq. alkali soln. contg. constituent elements of the multiple oxide or other multiple oxide to obtain the objective multiple oxide film having about 1-50μm thickness and a uniform compsn. from the bottom kept in contact with the substrate to the top. The hydrothermal treatment is carried out by hermetically sealing the substrate in an autoclave at room temp. and heating it to 100-200 deg.C. The formation of such a deposited layer and hydrothermal treatment are repeated if >50μm thickness is required.
申请公布号 JPH09157019(A) 申请公布日期 1997.06.17
申请号 JP19950337873 申请日期 1995.11.30
申请人 MITA IND CO LTD 发明人 NAKAYAMA NAOMI;NISHINO TOSHIO;TSUJI SEIJI;HAYASHI MASAKATSU;YAMADA JUNKO;FUJISHIMA MASAYUKI
分类号 C04B35/49;C01G25/00;C04B35/491;H01L41/187;H01L41/39 主分类号 C04B35/49
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