发明名称 LITHOGRAPHIC PLATE MATERIAL AND PREPARATION OF LITHO GRAPHIC PLATE
摘要 PROBLEM TO BE SOLVED: To provide a lithographic plate used for preparing a lithographic plate free from the fouling of a non-image line part and with a high plate wear by a completely dry process and a method for preparing the lithographic plate as well as a method for preparing the lithographic plate by the completely dry process through the direct control of an image formation using a digital signal. SOLUTION: (1) In a material for a lithographic plate for forming an image on a support using a sublimable compound, this sublimable compound has at least, one reactive group in a molecule. (2) In the above (1), the reactive group is a (metha)cryloyl group, an epoxy group or a group which can form a metal and chelate. (3) In the above (1), the reactive group is a vinylsulfonyl group or an ethylene imino group and the surface of the support has an active hydrogen. (4) The transparent support side of the material for the lithographic plate with a layer containing the above (1) sublimable compound provided on the transparent support, is exposed in an image-like form to a laser beam and thereby, the sublimable compound is selectively sublimated thermally to form an image in the unexposed part of the sublimable compound on the transparent support.
申请公布号 JPH09156069(A) 申请公布日期 1997.06.17
申请号 JP19950322985 申请日期 1995.12.12
申请人 KONICA CORP 发明人 MAEHASHI TATSUICHI;MATSUMOTO SHINJI;KUROKI TAKAAKI;KAWAKAMI SOTA
分类号 B41C1/06;B41C1/10;B41M5/26;B41M5/382;B41M5/46 主分类号 B41C1/06
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