发明名称 |
VACUUM VAPOR-PHASE REACTOR AND TREATMENT OF ITS WASTE GAS |
摘要 |
<p>PROBLEM TO BE SOLVED: To decontaminate a cleaning gas such as gaseous ClF3 and to easily clean a reaction chamber without using a dry decontaminator in a vacuum vapor-phase reactor using a water-sealed pump, with respect to the vacuum vapor-phase reactor and the treatment of its waste gas. SOLUTION: In the vacuum vapor-phase reactor having a mechanism for feeding gaseous ClF3 to remove the reaction product depositing in a reaction chamber 1, a water-sealed pump 10 with at least the impeller, side plate and intermediate wallboard formed with a corrosion-resistant metallic material such as stainless steel and Ni-base metal is provided in a gas exhaust pipe 6 after the mechanical booster pump 7 to discharge air, and the gaseous CIF3 and gasified reaction product are decontaminated.</p> |
申请公布号 |
JPH09157852(A) |
申请公布日期 |
1997.06.17 |
申请号 |
JP19950311829 |
申请日期 |
1995.11.30 |
申请人 |
FUJITSU LTD;SHINKO SEIKI CO LTD |
发明人 |
MATSUURA KATSUYOSHI;SAKAMOTO NAOKI;TSURUMI TORU;YAMANISHI HIROKAZU;KAMATA HIROYUKI;SATO YOSHIYASU;ABE KAZUHIDE;OMATSU HIROSHI;YAMAMOTO HIDEO;NISHIMURA NOBUHIRO |
分类号 |
B01D53/68;C23C16/44;H01L21/20;H01L21/205;H01L21/304;(IPC1-7):C23C16/44 |
主分类号 |
B01D53/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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