| 摘要 |
PROBLEM TO BE SOLVED: To polish the surface of a surface plate in a plane with a correcting carrier capable of uniformly polishing the surface of the surface plate, and polish a polishing object so as to reduce the dispersion of thickness and have the accurate parallel plane surface. SOLUTION: In a polishing device, an internal gear is arranged so as to have the specified gap in the periphery of a sun gear arranged in the rotation center, a carrier which meshes with the sun gear and the internal gear to conduct planetary motion and has a holding hole for holding a polishing object is arranged in the gap, an upper surface plate 11 and a lower surface plate 11 for polishing the polishing object are arranged on the upper surface and the lower surface of the carrier, and in order to polish the surface of the upper and lower surface plates of the polishing device in a plane, a correcting carrier 12 is used instead of the carrier. The diameter of a through hole 12a perforated in the correcting carrier 12 is made larger than the width W of the surface plate given by the dimension from the periphery of the sun gear to the periphery of the surface plate. |
