| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method capable of forming a multiplex oxide film with a desired thickness on a substrate with a minimal amount of masking material or without using any masking material. SOLUTION: A 1st multiple oxide film is formed on a substrate followed by removing a masking material, conducting an oxidation treatment to form an oxide film on the substrate; subsequently, in forming a 2nd multiple oxide film, at least the uppermost surface layer of the substrate contains one metal element among the constitutive metal elements of the 2nd multiple oxide, and the 2nd multiple oxide film is formed by hydrothermal reaction using an aqueous alkaline solution containing all the metal elements constituting the 2nd multiple oxide film. |
