| 摘要 |
A small fast atom beam source is capable of neutralizing ions at a high rate and of emitting a fast atom beam efficiently and with excellent directivity. A gas is introduced into the area between a plate-shaped anode having a plurality of atom emitting holes and a plate-shaped anode facing the cathode. A gas discharge is induced by a DC high-voltage power supply, thereby forming a plasma. Ions that are produced by the plasma are accelerated toward the cathode and neutralized in and near the atom emitting holes, which have lengths larger than the diameters thereof, thereby emitting a fast atom beam at a high rate of neutralization.
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