Belichtungsverfahren und -vorrichtung zum Bilden von Mikromustern

摘要

A method and an apparatus used to form a pattern on a wafer uses elliptically or circularly polarised light. The light may be determined by use of equations induced in accordance with the vector image theory and deriving S and P-polarized components (S com and P com ) (these components are perpendicular to and parallel to a meridional plane, respectively) of polarized light having x and y-directional components entering an illumination mask, thereby preventing a contrast difference resulting from a contrast gap generated in the conventional linear polarization method, namely, an inconsistency between the longitudinal direction of the pattern and the polarization direction.