| 摘要 |
<p>In order to produce a specific microsieve having a large number of precisely arranged passages of whatever form, a plastic foil (1) is coated with a layer of etch-resistant material (2, 2'). Recesses (4, 4') are etched in this layer (2, 2') at the locations where passages are to be formed. In a further process step, the passages (5) are produced by a plasma etching process. In addition, ducts (K, L) are inserted into the coating layer (2, 2') either as channels (K) or as solid paths. Several microsieves (S1, S2) are superimposed to form a specific composite body, oriented in such a way that the ducts (5, K, L) are cross-linked in the x, y and z directions. Examples of applications are fluid-conducting diaphragms, electroconductive multilayers and cross-linked light-guide microsystems.</p> |
