发明名称 |
Glass material variable in volume by irridation with ultraviolet light |
摘要 |
<p>A glass material variable in volume by irradiation with ultraviolet light has a GeO2-SiO2 glass composition having a GeO2 content of 0.5 to 90 mol %, and is in the form of a thin film formed in an argon atmosphere or in an argon-oxygen mixed gas atmosphere by the high-frequency sputtering method. <IMAGE></p> |
申请公布号 |
EP0778247(A1) |
申请公布日期 |
1997.06.11 |
申请号 |
EP19960308588 |
申请日期 |
1996.11.27 |
申请人 |
AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY |
发明人 |
NISHII, JUNJI;YAMANAKA, HIROSHI |
分类号 |
C03C3/06;C03C3/062;C03C3/076;C03C4/04;C03C17/02;C23C14/10;C23C14/34;C23C14/40;G02B6/13;(IPC1-7):C03C3/076;C03B19/14;G02B6/12 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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