| 摘要 |
<p>PROBLEM TO BE SOLVED: To overlap pixel electrodes and respective wirings for improving an opening rate and to lessen the influence that the capacitances between respective wirings and the pixel electrodes exert on display. SOLUTION: Interlayer insulating films 38 are formed on the upper parts of TFTs 24, gate wirings and source wirings 23. The pixel electrodes 21 are formed thereon. The pixel electrodes 21 are connected to the drain electrode 36b of the TFT 24 by connecting electrodes 25 via contact holes 26 penetrating these interlayer insulating films 38. The interlayer insulating films 38 consist of org. thin films consisting of acrylic photosensitive resins, etc., and have the lower dielectric constant than the dielectric constant of inorg. thin films consisting of silicon nitride, etc. The interlayer insulating films 38 are easily formable to a larger film thickness. The capacitances between the respective wirings and the pixel electrodes 21 are, therefore, decreased. Transparent conductive films are used for the connecting electrodes 25 for connecting the drain electrodes 36b of the TFTs 24 and pixel electrodes 21.</p> |
