| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to produce a large-sized liquid crystal display element substrate with an exposure mask of a small area by using the abrasion phenomenon of excimer lasers. SOLUTION: The resist applied on the substrate constituting the liquid crystal display element is patterned according to the opening patterns of the exposure mask 7 having the area smaller than the area of the thin-film pattern forming regions of the substrate and having prescribed opening patterns 7a, 7b, 7b', 7c, 7c' by abrasion phenomenon by relatively moving the exposure mask 7 within an X-Y plane parallel with these thin-film pattern forming regions and by irradiation of the exposure mask with excimer laser beams 12a, 12b, 12c formed to a slit form in a direction orthogonal with the relative moving direction. |
