SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To uniformly process semiconductor wafers and increase throughput by providing a T-shaped gas supply nozzle that includes a column having small gas spouting holes near a column flange and near a susceptor. SOLUTION: A very large vertical epitaxial growth system comprises a discoid susceptor 2 on which a plurality of wafer holders 2a is arranged in parallel to hold a semiconductor wafer 1. The growth system has a T-shaped nozzle 4 near the center 2c of the surface 2a of the susceptor 2, and the nozzle includes a column 4a for spouting process gas such as monosilane, and a flange 4b for controlling the direction 3a of the process gas 3. The semiconductor wafer 1 is heated through the susceptor by a work coil 5. The nozzle 4 has a plurality of small spouting holes 4f in a tip portion 4c of the column 4a, in a portion near the flange 4d and in a portion 4e near the susceptor.