发明名称 |
MANUFACTURE OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND LEAD FRAME |
摘要 |
PROBLEM TO BE SOLVED: To eliminate the affect of dross adhesion, improve flatness accuracy of lead leading edge and lead pitch accuracy after bending the leads and eliminate troubles due to dross dropping. SOLUTION: In the lead frame process prior to mounting a a semiconductor chip, half etching part 25 is previously formed on both the planes of a dam bar 24. The half etching part 25 is formed on the further side than a resin mold part 22. The dam bar 24 is cut by applying laser beams while discharging assist gas from a nozzle. The quantity of dross 27 is remarkably reduced and the dross 27 is stored in the half etching part 25. |
申请公布号 |
JPH09153580(A) |
申请公布日期 |
1997.06.10 |
申请号 |
JP19950312331 |
申请日期 |
1995.11.30 |
申请人 |
HITACHI CONSTR MACH CO LTD |
发明人 |
SAKURAI SHIGEYUKI;MITSUYANAGI NAOKI;SHIRAI TAKASHI;NAGANO YOSHIYA;SHIMOMURA YOSHIAKI;OKUMURA SHINYA;MINOMOTO YASUSHI |
分类号 |
B23K26/00;B23K26/38;H01L23/50 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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