| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. having satisfactory sensitivity, resolution and stability as a photosensitive resin compsn. generating an acid in a patterned latent image forming part when patternwise irradiated with radiation such as UV, far UV, X-rays or electron beams, making the solubility of the irradiated part to an alkali developer different from that of the unirradiated part and forming a pattern and to provide a method for producing a resist image by which a resist pattern having satisfactory resolution can be formed. SOLUTION: This compsn. is a chemical amplification type photosensitive resin compsn. contg. a resin soluble in an aq. alkali soln., a compd. which generates an acid when irradiated with active chemical rays, a medium having such reactivity as to vary solubility to the aq. alkali soln. by a reaction with the acid as a catalyst and a solvent. This compsn. is obtd. by filtration after ripening. A coating film of the compsn. is irradiated with active chemical rays and developed to produce the objective resist image. |
