DEVICE FOR IRRADIATING RANGE OF MICRON UNIT AND/OR SUBMICRONUNIT IN PHOTOSENSITIVE LAYER AND METHOD OF FORMING PATTERN IN SUCH LAYER

摘要

PROBLEM TO BE SOLVED: To provide an apparatus to irradiate beam to a range in micron scale of a photosensitive layer and provide a method for formation of a pattern of such a layer. SOLUTION: This method involves the processes of exposing a resin layer 120 to the atmosphere containing a liquid which does not have high wettability to a photosensitive material to form a single layer 121 of fine dews on the resin layer 120; irradiating beam to the photosensitive material layer through the single layer 121 of droplets to selectively print exposed regions 122 of the resin layer; removing the single layer 121 of droplets; and developing the photosensitive material layer to form a pattern which is conformed to the exposed regions.