| 摘要 |
PROBLEM TO BE SOLVED: To prevent the adhesion of organic matter or moisture or the adhesion of dust from a wafer carrying-in device to a wafer during its storage in a clean room by forming constitution of a wafer storing device installed in the clean room and a gas supply device in which a separately-placed chemical filter is provided. SOLUTION: A plurality of wafer cassettes 27 can be stored in vertical and in horizontal directions in a wafer cassette storing shelf 21 installed face to face. A gas supply machine 41 with a separately-placed chemical filter 58 is installed in a wafer storing device 200. For the chemical filter 58, a chemical filter being put on sale from, for instance, Toyo Rayon, Dow Corning Silicone Company is used. A gas 42 supplied from the gas supply machine 41 is sent to a plurality of wafer storing devices 200 through a duct 43. Unnecessary organic matter is not diffused into a semiconductor device and also an unspecified oxide film is not formed but a stable film formation state can be held. The chemical filter is easy to replace.
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