| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film having excellent antireflection performance of visible light and shieldability of external electromagnet waves. SOLUTION: This conductive antireflection film 2 is composed of a transparent oxide thin film 21 of 51nm thickness, silver thin film 22 of about 9nm thickness and transparent oxide thin film 23 of about 13nm thickness successively laminated on a polarizing film 10 which is a base material. The transparent oxide thin films 21, 23 consist of the thin films of an oxide mixture composed of gallium oxide, cerium oxide and silicon oxide and the compsn. ratios thereof are the amts. to attain 85atm.% gallium element, 5atm.% cerium element and 10atm.% silicon element. The refractive index thereof is about 1.85. The antireflection film has the silver thin film 21 and, therefore, has the excellent electrical conductivity and electromagnet wave shielding performance. Since this film is provided with the transparent oxide thin film having the low refractive index, the film has also the excellent antireflection performance as well. |
