发明名称 POSITIVE CHEMICALLY AMPLIFYING PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF RESIST IMAGE
摘要 PROBLEM TO BE SOLVED: To provide a positive photosensitive resin compsn. having high sensitiv ity, high resolution and high heat resistance by incorporating a resin which is soluble in an alkali soln., a specified polyphenol compd., a compd. which produces acid by irradiation of active chemical rays, and a vinyl polymer having such groups on the side chains that increase solubility with an alkali soln. by acid catalyst reaction. SOLUTION: This resin compsn. consists of (a) a resin solubble in an alkali soln., (b) a polyphenol compd. expressed by formula I or formula II, (c) a compd. which produces acid by irradiation of active chemical rays, and (d) a vinyl polymer having such a group in the side chain that is decomposed by acid and increases solubility with an alkali soln. by acid catalyst reaction. In formula I, R<1> and R<2> are 1-4C alkyl groups, aryl groups, etc., f and g are 0, 1 or 2, and h and i are 1, 2 or 3. In formula II, R<5> and R<6> are 1-3C alkyl groups, j and k are 0, 1 or 2, and 1 and m are 1, 2 or 3.
申请公布号 JPH09152715(A) 申请公布日期 1997.06.10
申请号 JP19950310179 申请日期 1995.11.29
申请人 HITACHI CHEM CO LTD;HITACHI LTD 发明人 KATO KOJI;HASHIMOTO MASAHIRO;HASHIMOTO MICHIAKI;SAKAMIZU TOSHIO;SHIRAISHI HIROSHI
分类号 G03F7/004;G03F7/033;G03F7/039;G03F7/30;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
代理机构 代理人
主权项
地址