发明名称 ROTARY DRUM ION IMPLANTATION DEVICE
摘要 PROBLEM TO BE SOLVED: To make a replacement of substrates in parallel with implantation of ions into the substrate at the same time. SOLUTION: A rotary drum 11 is mounted with four substrate holder units 14 which are arranged on its peripheral surface separate from each other by an angle of 90 deg. and rotated in a certain direction stepping by an angle of 90 deg.. A substrate implanted with ions is replaced with another substrate not implanted with ions at a substrate holder unit 14 located at an uppermost position and kept in a horizontal position, the rotary drum 11 is rotated by an angle of 90 deg. to make the substrate 1 confront an ion source 9, and ions are implanted into the substrate 1. While ions are implanted, the substrate is replaced at the substrate holder unit 14 located at the uppermost position and held in a horizontal position at the same time. When an electrostatic chuck is provided to the substrate holder unit, elimination of static from the chuck is started when ion implantation is finished and finished before an implanted substrate reaches to a substrate replacing position.
申请公布号 JPH09153465(A) 申请公布日期 1997.06.10
申请号 JP19950334328 申请日期 1995.11.30
申请人 NISSIN ELECTRIC CO LTD 发明人 FUJITA SHIGEHIRO
分类号 H01J37/317;H01L21/265;H01L21/677;H01L21/68;H01L21/683;(IPC1-7):H01L21/265 主分类号 H01J37/317
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