发明名称 |
Process for producing patterned resin films which includes pretreatment with water soluble salt aqueous solution prior to film development |
摘要 |
An uncomplicated and easy to control process for forming patterns, wherein an active beam sensitive resin is exposed to an active beam such that a correctly formed pattern is produced on the resin. The process comprises the steps of forming a film of an active beam sensitive resin on a substrate, exposing the film to an active beam, and developing the exposed film with a developing solution comprising a weakly basic salt in a basic aqueous solution having a hydrogen ion concentration sufficient to finish the developing within a desired period of time and an ionic strength sufficient to prevent a substantial decrease in the thickness of the exposed film.
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申请公布号 |
US5637443(A) |
申请公布日期 |
1997.06.10 |
申请号 |
US19940267202 |
申请日期 |
1994.07.05 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
YOSHIDA, YASUHIRO;KUBOTA, SHIGERU;YAMAGUCHI, AKIHIKO;ISHIBASHI, KENICHIRO |
分类号 |
G03F7/26;G03F7/32;G03F7/38;H01L21/027;(IPC1-7):G03C5/00;B08B3/12;B08B3/00;B08B6/00 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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