发明名称 X-RAY MASK AND ITS PREPARATION
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray exposure mask allowing a circuit pattern to a window on an exposure mask to be easily aligned with a mask-to-water alignment marks. SOLUTION: An X-ray mask has one or more X-ray transmission mask windows 16 and 20, at least a pair of pattern-to-mask alignment marks 24 etched into a mask substrate from the same side as the windows 16 and 20. The marks 24 are etched at the same time as the windows 16 and 20 and can be detected from the front surface of the mask substrate 10 by an electron beam lithography apparatus to form a circuit pattern formed in advance. The alignment marks can be detected because of no back scattering electron on the marks 24.</p>
申请公布号 JPH09148242(A) 申请公布日期 1997.06.06
申请号 JP19960121254 申请日期 1996.05.16
申请人 INTERNATL BUSINESS MACH CORP (IBM) 发明人 KEN TSUUEEKIN CHIYAN;UIRIAMU ARUBAATO ENICHIEN;JIYOBUN JIYOOJI HAATORII;MARISU ANDORISU SUTEYURANZU
分类号 G03F1/16;G03F7/20;G03F9/00;G21K1/06;H01L21/027;H01L21/302;(IPC1-7):H01L21/027 主分类号 G03F1/16
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