发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF RESIST IMAGE
摘要 PROBLEM TO BE SOLVED: To obtain a compsn. contg. a nearly harmless solvent satisfying sufficiently high power to dissolve a resist material, a proper rate of evaporation, proper surface tension and viscosity by using a specified acetic ester. SOLUTION: This compsn. is a chemical amplification type photosensitive resin compsn. contg. a resin soluble in an aq. alkali soln., a compd. which generates an acid when irradiated with active chemical rays, a medium having such reactivity as to vary solubility to the aq. alkali soln. by a reaction with the acid as a catalyst and a solvent which is 5-9C acetic ester represented by the formula (where R is 3-7C alkyl, alkenyl, alkynyl or phenyl), e.g. n-propyl acetate, isopropyl acetate, isopropenyl acetate, n-butyl acetate or isobutyl acetate.
申请公布号 JPH09146278(A) 申请公布日期 1997.06.06
申请号 JP19950308997 申请日期 1995.11.28
申请人 HITACHI CHEM CO LTD;HITACHI LTD 发明人 KATO KOJI;HASHIMOTO MASAHIRO;NISHIO SHIGERU;HASHIMOTO MICHIAKI;SAKAMIZU TOSHIO;SHIRAISHI HIROSHI
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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