| 摘要 |
PROBLEM TO BE SOLVED: To provide a method which enables easy direction of relative misalignment of first and second transfer arms even when the wafer delivery position is not visually recognizable, and which also enables correction of the misalignment. SOLUTION: A jig 5 is set on a transfer arm 2, and the position correction function of a tapered portion T2 of the transfer arm 2 is canceled. Then, a wafer 10 held by a transfer arm 1 is delivered to the transfer arm 12 via a wafer delivery position, and the transfer arm 2 moves to a standby position which is visually recognizable. Then, the quantity of misalignment of the wafer held by the transfer arm is measured, and the relative misalignment of the transfer arm is corrected on the basis of the measured quantity of misalignment. |
