发明名称 Process for producing dendritic crystals of semiconductor materials
摘要 <p><PICT:0913678/III/1> In pulling a dendritic crystal upwards from a supercooled melt using a seed crystal having three interior twin planes and orientated as shown in Fig. 2, the outer planes are spaced from the inner plane respective distances (A and B) of 0,5-5 and 0,5-30 microns. Preferred distances are 1,7 and 5 microns. One or two dendritic crystals grow from a single seed depending on the conditions of pulling. A pulled dendritic crystal may have a thickness of 1-25 mils and a width of 20-200 mils. Further details of crystal materials and conditions of pulling are as in Specifications 889,058 and 913,674.</p>
申请公布号 GB913678(A) 申请公布日期 1962.12.28
申请号 GB19610005330 申请日期 1961.02.13
申请人 WESTINGHOUSE ELECTRIC CORPORATION 发明人
分类号 C30B15/36;C30B29/60;H01L21/00 主分类号 C30B15/36
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