Vorrichtung und Verfahren zum Erfassen von Partikeln in einer Prozesskammer einer Ionenimplantationsanlage

摘要

A detector to monitor contaminant particles during operation of an ion implanter comprises a laser and means to sense laser radiation diffracted by contaminant particles. The output pulses of the detector can be counted to indicate the level of contamination, the amplitude of the pulses indicating the size of the particles. The outputs of the detector during loading of wafers to be implanted, during ion implantation and during unloading of the wafers may be compared.