Temperature regulation apparatus

摘要

The present invention relates to a temperature regulation apparatus capable of easily regulating the temperature of a support for a substance to be treated, such as a semiconductor wafer. The temperature regulation apparatus 30 includes a liquid nitrogen supply device 34 for supplying liquid nitrogen into a temperature regulation space 32 provided in the inside of a support 16 so as to effect flashing of the liquid nitrogen. A heating device 46 for heating the support 16 and temperature sensors 58,60 for detecting the temperature of the support 16 are also provided. A temperature setting device 64 sets the temperature of the support 16 at a desired temperature and a controller 44 controls the liquid nitrogen supply device 34 and the heating device 46 based on a temperature detected by the temperature sensors 58, 60, so that the support 16 reaches and is maintained at the set temperature.