Base developable negative photoresist and use thereof
摘要
<p>A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.</p>
申请公布号
EP0534204(B1)
申请公布日期
1997.06.04
申请号
EP19920115167
申请日期
1992.09.04
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BABICH, EDWARD D.;GALLIGAN, EILEEN A.;GELORME, JEFFREY D.;MCGOUEY, RICHARD P.;NUNES, SHARON L.;PARASZCZAK, JURIJ R.;SERINO, RUSSELL J.;WITMAN, DAVID F.
