发明名称 MANUFACTURE OF WAFER AND APPARATUS USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To eliminate the complicated labor-hour by reducing the material waste as much as possible sanitarily in the case of cutting a wafer. SOLUTION: The method for manufacturing a wafer comprises the steps of supplying etching gas to the part to be cut of a crystal ingot 3, exciting the gas components by laser emitting or photon emitting, chemically reacting the component of the ingot 3 with the excited gas component to continuously volatilize and remove the part to be cut of the ingot 3 by each small area while moving the place, finally volatilizing to remove the entire part to be cut, and quarrying a wafer 10.
申请公布号 JPH09141645(A) 申请公布日期 1997.06.03
申请号 JP19950302749 申请日期 1995.11.21
申请人 DAIDO HOXAN INC 发明人 YOSHINO AKIRA;YOKOYAMA TAKASHI;OMORI NOBUNORI;YAMAMOTO KAZUMA
分类号 B28D5/00;B28D5/04;H01L21/301;H01L21/302;H01L21/304 主分类号 B28D5/00
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