发明名称 Photosensitive resin composition and method for forming a pattern using the composition
摘要 A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the alkali-soluble resin is a polycondensation product of +E,crc 1+EE at least one phenolic compound (A) of the following formula (A) with +E,crc 2+EE formaldehyde (a) and at least one carbonyl compound (b) of the following formula (B), in which the mixing ratio of the formaldehyde (a) to the carbonyl compound (b) is within a range of from 1/99 to 99/1 in terms of the molar ratio of (a)/(b), and the alkaline soluble resin has partial structures of the following formula (C), in which the weight ratio of repeating units ( beta ) wherein m is from 1 to 5, to repeating units ( alpha ) wherein m is 0, i.e. the weight ratio of ( beta )/( alpha ), is at most 0.25: <IMAGE> (A) <IMAGE> (B) <IMAGE> (C) wherein R1 is a group of the formula R2, OR3, COOR4 or CH2COOR5, wherein R2 is a C1-4 alkyl group, each of R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-4 alkyl group, n is an integer of from 0 to 3, provided that when n is 2 or 3, a plurality of R1 may be the same or different, each of R6 and R7 which are independent of each other, is a hydrogen atom, a C1-4 lower alkyl group, an aryl group or an aralkyl group, R8 is the same group as R1, R9 is the same group as R6, R10 is the same group as R7, p is the same integer as n, provided that R6 and R7, and R9 and R10, are not simultaneously hydrogen atoms, and m is an integer of from 0 to 5.
申请公布号 US5635329(A) 申请公布日期 1997.06.03
申请号 US19940359822 申请日期 1994.12.20
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 NISHI, MINEO;NAKANO, KOJI;IKEMOTO, MAKOTO
分类号 G03F7/023;(IPC1-7):G03F7/023 主分类号 G03F7/023
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