CHEMICAL VAPOR DEPOSITION - PRODUCED SILICON CARBIDE HAVING IMPROVED PROPERTIES

摘要

beta -silicon carbide which is optically transmitting in the visible and infrared regions is produced by chemical vapor deposition. Deposition conditions are temperatures within a 1400-1500 DEG C range, pressure 6.7kPa or less, H2/methyltrichlorosilane molar ratios of 4:-30: 1 and a deposition rate of 1 mu m or less. <IMAGE>