发明名称 Submerged laser beam irridation equipment
摘要 <p>A submerged laser beam irradiation equipment of the invention provides a high quality submerged laser beam processing of a submerged workpiece using only a small amount of a gas. The submerged laser beam irradiation equipment comprises: a focus lens for focusing a laser beam; a mirror tube which houses the lens; a first nozzle provided to cover the front end of the mirror tube in an irradiating direction of the laser beam; a skirt portion provided at the front end of said first nozzle for preventing water immersion thereinto; and a shutter means operable to open and close provided between said skirt portion and said mirror tube for preventing water immersion to said mirror tube. <IMAGE></p>
申请公布号 EP0775549(A2) 申请公布日期 1997.05.28
申请号 EP19960308173 申请日期 1996.11.12
申请人 HITACHI, LTD. 发明人 ONUMA, TSUTOMU;MATSUMOTO, TOSHIMI;ONUMA, AKIRA;NAKAMURA, MITSUO;ASANO, CHOICHI;TAMAI, YASUMASA;KOIDE, HIROO;KURIHARA, MASAYUKI;FUNAMOTO, TAKAO;ISHIKAWA, FUMINORI
分类号 B23K26/12;(IPC1-7):B23K26/00;B23K26/14 主分类号 B23K26/12
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