WAFER BOAT FOR VERTICAL FURNACE

摘要

PROBLEM TO BE SOLVED: To suppress the crystal defect due to the weight of a wafer by supporting the back side of the wafer at positions deviated to its periphery at a distance of 2/3 of the wafer radius from the center of the wafer with support bars of posts erected nearly normally to the main face of the wafer. SOLUTION: A boat to hold a wafer 8 has support posts 9 erected nearly vertically from peripheral positions of the wafer 8 and bars 10 laterally extending to the inward located wafer from the posts 9. Each bar 10 has a rounded protrusion 12 at the inner end to make a point contact with a wafer back side at the position distant 2/3 of the wafer radius to the periphery from the center of the wafer (001) 8.