| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist pattern with a good dimensional accuracy. SOLUTION: First, on a substrate 1 to be processed, a resist film 2 is formed. Then, to the resist film 2, a solution 4 of a hydrous polymer is applied. Subsequently, bridging macromolecules in the hydrous polymer, a hydrogel film 4a with a predetermined film thickness is formed. Further, after via the hydrogel film 4a the resist film 2 is exposed to be patterned, the hydrogel film 4a is removed therefrom. |
