METHOD OF CLEANING DEPOSIT FROM SPUTTERING CLEANING CHAMBER,申请号JP19960150486-传众专利搜索

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发明名称	METHOD OF CLEANING DEPOSIT FROM SPUTTERING CLEANING CHAMBER
摘要
申请公布号	JPH09139349(A)	申请公布日期	1997.05.27
申请号	JP19960150486	申请日期	1996.05.23
申请人	VARIAN ASSOC INC	发明人	SHIAMAKU SARIMIAN
分类号	C23C14/00;C23C14/56;C23F4/00;H01L21/203;H01L21/205;H01L21/302;H01L21/306;H01L21/3065;(IPC1-7):H01L21/203	主分类号	C23C14/00
代理机构		代理人
主权项
地址

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