| 摘要 |
PROBLEM TO BE SOLVED: To form a functional material and a high quality thin film material which have been impossible to form heretofore or to remarkably improve the microfabricating characteristics. SOLUTION: Plasma 109 of primary substance composed of a reactive gas introduced into a vacuum vessel 10 is formed, and furthermore, secondary substance composed of either one kind among a reactive gas, a solid material and a liq. material is dissolved in the outside of the plasma to generate a radical 116 in which the density and/or compsn. is regulated, and the generated radical 116 is injected into the plasma 109, by which a thin film is formed on the substrate 107 to be treated arranged in the plasma, or the substrate to be treated is subjected to microfabrication. |
