| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist compsn. having high sensitivity while keeping high resolving power and not generating dust at the time of heat treatment by incorporating a specified arom. carboxylic acid compd. SOLUTION: This compsn. is a positive type photoresist compsn. contg. an alkali-soluble resin, a radiation sensitive compd. and an arom. carboxylic acid compd. represented by the formula, wherein R<1> is hydroxyl, 1-4C alkyl or 1-4C alkoxy, each of R<2> and R<3> is H, 1-4C alkyl or 1-4C alkoxy, (l) is an integer of 0-4, (n) is an integer of 0-3, and in the case of l>=2, plural R<1> s may be different from each other. |
