| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer-aligning device in which the generation of dust is negligible. SOLUTION: A water-aligning device comprises a vertically movably notch 17 that consists of a shaft 47 and a notch roller attached loosely to the shaft to align wafer 5, which have a cut in the periphery 6 and stored in a carrier 1. The notch roller is divided into plural wafers 5 so as to correspond to individual wafers 5. When moved upward, the notch roller comes into contact with wafer peripheries and engages with the cuts 7 in the peripheries of the wafers 5 that are rotated by a drive roller 15, so that the wafers 5 are aligned in predetermined positions.</p> |
