发明名称 Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine
摘要 A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.
申请公布号 US5633112(A) 申请公布日期 1997.05.27
申请号 US19940319788 申请日期 1994.10.07
申请人 HITACHI, LTD.;HITACHI CHEMICAL COMPANY, LTD. 发明人 MIWA, TAKAO;OKABE, YOSHIAKI;ISHIDA, MINA;TAKAHASHI, AKIO;NUMATA, SHUNICHI
分类号 G03F7/004;G03F7/021;G03F7/039;H01L21/027;(IPC1-7):G03F7/021 主分类号 G03F7/004
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