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发明名称
METHOD FOR TREATING SEMICONDUCTOR SUBSTRATES
摘要
申请公布号
KR970008326(B1)
申请公布日期
1997.05.23
申请号
KR19930018338
申请日期
1993.09.13
申请人
TOSHIBA KK.
发明人
MIYASHITA, NAOTO;TAKAHASHI, KOICHI;KOYAMA, MITSUTOSHI
分类号
H01L21/302;H01L21/304;H01L21/306;H01L21/31;(IPC1-7):H01L21/00
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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