EXPOSURE MASK FOR PRODUCTION OF SEMICONDUCTOR ELEMENTS

摘要

A photo-exposed mask used for manufacturing a semiconductor element capable of forming exactly sensitive film by coinciding a same focus line with a surface of a sensitive film is disclosed. The photo-exposed mask is used for a photo-exposed process which forms a sensitive pattern crossing a cell area and a periphery circuit area on a semiconductor element. A stepped film is formed at a portion which corresponds to a periphery circuit area of a semiconductor element on a transparent substrate. A cut-off film pattern is formed on the stepped portion and transparent substrate.