发明名称 A novel via hole profile and method fabrication
摘要 A novel high performance and reliable interconnection structure for preventing via delamination. The interconnection structure of the present invention comprises a via connection which extends into and undercuts an underlying interconnection line to lock the via connection into the interconnection line.
申请公布号 GB9706661(D0) 申请公布日期 1997.05.21
申请号 GB19970006661 申请日期 1995.07.14
申请人 INTEL CORPORATION 发明人
分类号 H01L21/3213;H01L21/768;H01L23/522;H01L23/532 主分类号 H01L21/3213
代理机构 代理人
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