发明名称 BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To easily find the inclination center without requiring troublesome operation, and observe a cross section of a submicron order by finding the inclination center of a stage by a specific method in a beam device having a prescribed constitution. SOLUTION: A beam device is composed of a beam irradiating system 13 to scan and irradiate a sample surface 2, a control part 12 to read a present value of a lens condition of the beam irradiating system 13, a stage 3 having three-axis driving systems 6 and 7 which fixe a sample 2 and move it to an optional area and an inclined axis driving system 5 in parallel to one of three shafts, a position detector 9 to read a present position of the respective driving systems 5, 6 and 7 and a control computer 4 to control these. In this beam device, the inclination center PO of the stage is found from an inclinationθand an optical axis sample position (h) (a variation in a working distance) existing just under a beam at that time. Therefore, the inclination center can be easily found without requiring troublesome operation such as tracking positional dislocation caused by an inclination of a reference mark.
申请公布号 JPH09134691(A) 申请公布日期 1997.05.20
申请号 JP19950290845 申请日期 1995.11.09
申请人 HITACHI LTD 发明人 KAGA HIROYASU
分类号 G01B11/02;H01J37/20;H01J37/30;(IPC1-7):H01J37/20 主分类号 G01B11/02
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