| 摘要 |
<p>PROBLEM TO BE SOLVED: To simply manufacture a matrix substrate for application to a flat panel display. SOLUTION: A lower electrode layer 110 is formed on a glass substrate 100, and the first resist layer having the insulator grain dispersion type positive photosensitive characteristic is formed on the whole upper face. A back exposure is applied via a photo-mask for shielding the region functioning as a line direction wiring layer in an upper electrode layer 130, the first resist layer is developed to remove an exposure section, and the remaining section is baked to form an insulating layer 120 having a shielding property. The second resist layer having the metal grain dispersion type or organic metal mixing type positive photosensitive characteristic is formed on it. A front exposure is applied via a photo-mask for exposing the region corresponding to a separation zone Z, then a back exposure is applied to the whole substrate 100, the second resist layer is developed to remove the exposure section, the remaining section is baked to form the upper electrode layer 130, and an electron emitting film 140 is finally formed.</p> |
