| 摘要 |
PROBLEM TO BE SOLVED: To simplify the operation of an etching sequence by simultaneously generating two chemical beams which are converged toward a substrate or epitaxial layer in an ultrahigh vacuum and maintaining the epitaxial layer at such a temperature that can evaporate the resulted product of the reaction between the element of the substrate and the substance contained in the chemical beams. SOLUTION: A substrate manipulator 3 winch holds a substrate 2 during treatment is provided in an epitaxial chamber 1 and, when an etching sequence is operated, two chemical beams which are converged toward the substrate 2 of an epitaxial layer are simultaneously generated from electron guns 8 in the chamber 1 maintained in an ultrahigh vacuum by adjusting the angular position of the manipulator 3 so that the surface of the substrate 2 can face plowing-out units 4, 5, 6, and 7 related to individual retracting screens. Then the substrate 2 or epitaxial layer is maintained at such a sufficiently high temperature that can evaporate a resulted produce of the reaction between the element of the substrate 2 and the substance contained in the chemical beams with a thermocouple 18 which measures the heating filament of a supply tube 16.
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