| 摘要 |
PROBLEM TO BE SOLVED: To obtain antireflection performance, wear resistance, resistance against water spots, contamination resistance and antifogging property by forming the surface of a product in such a manner that an inorg. material having water repellency and a hydrophilic material are present and controlling the static contact angle of the surface with water to a specified or larger. SOLUTION: An antireflection film is formed by vacuum vapor deposition while introducing a gas. The gas is introduced into the uppermost layer having low refractive index of the antireflection film. Silicon dioxide is preferably used for the low refractive index layer of the antireflection film, since a hard film can be formed even at low temp. In this case, the uppermost layer of a single-layer or multilayered antireflection film has pores and minute recesses and the packing rate of the inorg. material in the uppermost layer is controlled to <=0.95. A hydrophilic material is made present in the pores and minute recesses so that the uppermost surface consists of the inorg. material and the hydrophilic material. The static contact angle of the inorg material surface with water is controlled to >=90 deg.. As for the hydrophilic material, surfactants, hydrophilic monomers and polymers of these monomers can be used. |
